发明申请
- 专利标题: CONTACT RESISTANCE MEASUREMENT FOR RESISTANCE LINEARITY IN NANOSTRUCTURE THIN FILMS
- 专利标题(中): 接触电阻测量在纳米薄膜中的电阻线性
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申请号: US12862548申请日: 2010-08-24
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公开(公告)号: US20110042126A1公开(公告)日: 2011-02-24
- 发明人: Michael Spaid , Florian Pschenitzka
- 申请人: Michael Spaid , Florian Pschenitzka
- 申请人地址: US CA Sunnyvale
- 专利权人: CAMBRIOS TECHNOLOGIES CORPORATION
- 当前专利权人: CAMBRIOS TECHNOLOGIES CORPORATION
- 当前专利权人地址: US CA Sunnyvale
- 主分类号: H05K1/00
- IPC分类号: H05K1/00 ; G01R27/08
摘要:
The present disclosure is directed to a transparent conductor for use in touch panel devices having a plurality of nanostructures therein that provides reliable output based on user touch or pen input. To determine if a touch panel is reliable, there is disclosed a method of measuring voltages across the transparent conductor when it is touched. These measured voltages are converted into contact resistances, which are statistically analyzed. A median contact resistance is determined based on the converted contact resistances. The remaining set of converted contact resistances are analyzed to determine if they are within acceptable limits. Acceptable limits may include most of the contact resistances falling within a range, none of the contact resistances exceeding an upper limit, and a difference in contact resistances converted for different users or pens does not exceed a maximum variability.
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