Invention Application
- Patent Title: Metrology Method and Apparatus, Lithographic Apparatus, Device Manufacturing Method and Substrate
- Patent Title (中): 计量方法和装置，平版印刷装置，装置制造方法和基板
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Application No.: US12855394Application Date: 2010-08-12
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Publication No.: US20110043791A1Publication Date: 2011-02-24
- Inventor: Hendrik Jan Hidde Smilde , Arno Jan Bleeker , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Henricus Petrus Maria Pellemans , Reinder Teun Plug , Willem Marie Julia Marcel Coene
- Applicant: Hendrik Jan Hidde Smilde , Arno Jan Bleeker , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Henricus Petrus Maria Pellemans , Reinder Teun Plug , Willem Marie Julia Marcel Coene
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G01N21/41
- IPC: G01N21/41
Abstract:
A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.
Public/Granted literature
- US08411287B2 Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate Public/Granted day:2013-04-02
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