发明申请
- 专利标题： Metrology Method and Apparatus, Lithographic Apparatus, Device Manufacturing Method and Substrate
- 专利标题（中）： 计量方法和装置，平版印刷装置，装置制造方法和基板
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申请号： US12855394申请日： 2010-08-12
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公开(公告)号： US20110043791A1公开(公告)日： 2011-02-24
- 发明人: Hendrik Jan Hidde Smilde , Arno Jan Bleeker , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Henricus Petrus Maria Pellemans , Reinder Teun Plug , Willem Marie Julia Marcel Coene
- 申请人： Hendrik Jan Hidde Smilde , Arno Jan Bleeker , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Henricus Petrus Maria Pellemans , Reinder Teun Plug , Willem Marie Julia Marcel Coene
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G01N21/41
- IPC分类号： G01N21/41
摘要：
A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.
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