公开(公告)号：US09235141B2

公开(公告)日：2016-01-12

申请号：US13186895

申请日：2011-07-20

申请人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

发明人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

IPC分类号： G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00 ,  G01N21/47

CPC分类号： G03F7/70633 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G03F7/70616 ,  G03F9/70

摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.

摘要翻译： 检查装置测量包括周期性结构的基板的性质。 照明系统提供具有包括多个照明部分的照明轮廓的辐射束。 辐射投影仪将辐射束投影到基板上。 检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。 处理器根据检测到的辐射来确定衬底的性质。 多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。 此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

公开(公告)号：US09122178B2

公开(公告)日：2015-09-01

申请号：US13388267

申请日：2010-07-02

申请人： Vitalii Ivanov ,  Vadim Yevgenyevich Banine ,  Arie Jeffrey Den Boef ,  Luigi Scaccabarozzi ,  Nikolay Nikolaevich Iosad

发明人： Vitalii Ivanov ,  Vadim Yevgenyevich Banine ,  Arie Jeffrey Den Boef ,  Luigi Scaccabarozzi ,  Nikolay Nikolaevich Iosad

IPC分类号： G01J3/28 ,  G01N21/00 ,  G03F1/84 ,  G01N21/64 ,  G01N21/65 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G03F1/24

CPC分类号： G03F1/84 ,  G01N21/6408 ,  G01N21/6489 ,  G01N21/65 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G03F1/24

摘要： Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the object to be inspected due to their different materials. Time resolved spectroscopy and/or energy resolved spectroscopy of secondary photon emission from the surface of the object can be used to obtain Raman and photoluminescence spectra. The objects to be inspected can for example be a patterning device as used in a lithographic process, for example a reticle, in which case the presence of metal, metal oxide or organic particles can be detected, for example. The methods and apparatus are highly sensitive, for example, being able to detect small particles (sub 100 nm, particularly sub 50 nm) on the patterned side of an EUV reticle.

摘要翻译： 用于检查物体的方法和系统包括使用光谱技术来检测物体表面上的不需要的颗粒，这是由于不同的物质与不同的物质相比，由于不同的物质而与被检查物体的不同响应。 可以使用来自物体表面的二次光子发射的时间分辨光谱和/或能量分辨光谱来获得拉曼和光致发光光谱。 待检查的物体可以是例如在光刻工艺中使用的图案形成装置，例如掩模版，在这种情况下，例如可以检测到金属，金属氧化物或有机颗粒的存在。 所述方法和装置是高度敏感的，例如能够检测EUV掩模版图案侧的小颗粒（小于100nm，特别是低于50nm）。

公开(公告)号：US08830455B2

公开(公告)日：2014-09-09

申请号：US12805808

申请日：2010-08-19

申请人： Arie Jeffrey Den Boef ,  Vadim Yevgenyevich Banine ,  Sander Frederik Wuister ,  Luigi Scaccabarozzi

发明人： Arie Jeffrey Den Boef ,  Vadim Yevgenyevich Banine ,  Sander Frederik Wuister ,  Luigi Scaccabarozzi

IPC分类号： G01N21/00

CPC分类号： G01N21/95623

摘要： In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.

摘要翻译： 在一方面，公开了一种用于检测物体上缺陷的存在或不存在的检查方法，该物体包括具有物理深度的凹部。 该方法包括在物体上引导辐射，辐射具有基本上等于凹部的光学深度的两倍的波长，检测由对象重新引导的辐射或物体上的缺陷，以及确定存在或不存在 来自重新导向的辐射的缺陷。

公开(公告)号：US08823922B2

公开(公告)日：2014-09-02

申请号：US13000229

申请日：2009-05-14

申请人： Arie Jeffrey Den Boef

发明人： Arie Jeffrey Den Boef

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70633

摘要： An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unit is connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.

摘要翻译： 覆盖测量装置具有用于利用偏振光束照射样本的偏振光源和用于捕获被样品散射的光的光学系统。 光学系统包括偏振器，用于透射与偏振光束的偏振方向正交的正交偏振分量。 检测器测量正交偏振分量的强度。 处理单元连接到检测器，并且被布置为使用从正交偏振分量导出的不对称数据来处理用于覆盖测量测量的正交偏振分量。

公开(公告)号：US08767183B2

公开(公告)日：2014-07-01

申请号：US12794192

申请日：2010-06-04

申请人： Arie Jeffrey Den Boef

发明人： Arie Jeffrey Den Boef

IPC分类号： G03B27/32 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70633 ,  G03F9/7046 ,  G03F9/7065 ,  G03F9/7088 ,  G03F9/7092

摘要： In order to improve overlay measurement, product marker gratings on a substrate are measured in a lithographic apparatus by an alignment sensor using scatterometry. Then information relating to the transverse profile of the product marker grating, such as its asymmetry, is determined from the measurement. After printing an overlay marker grating on a resist film, the lateral overlay of the overlay marker grating with respect to the product marker grating is measured by scatterometry and using the determined asymmetry information in combination with a suitable process model. The alignment sensor data may be used to first reconstruct the product grating and this information is fed forward to the scatterometer that measures the stack of product and resist grating and light scattered by the stack is used for reconstruction of a model of the stack to calculate overlay. The overlay may then, optionally, be fed back to the lithographic apparatus for correction of overlay errors.

摘要翻译： 为了改善覆盖测量，通过使用散射测量的对准传感器在光刻设备中测量衬底上的产品标记光栅。 然后，从测量确定与产品标记光栅的横向轮廓相关的信息，例如其不对称性。 在抗蚀剂膜上印刷覆盖标记光栅之后，通过散射法测量覆盖标记光栅相对于产品标记光栅的横向覆盖，并且使用所确定的不对称信息与合适的工艺模型相结合。 对准传感器数据可以用于首先重建产品光栅，并且将该信息向前馈送到测量产品堆叠并抵抗光栅的散射仪，并且由堆叠散射的光用于重建堆叠的模型以计算叠加 。 然后，覆盖层可以可选地被反馈到光刻设备以校正重叠误差。

公开(公告)号：US08749775B2

公开(公告)日：2014-06-10

申请号：US12882631

申请日：2010-09-15

申请人： Leonardus Henricus Marie Verstappen ,  Arie Jeffrey Den Boef

发明人： Leonardus Henricus Marie Verstappen ,  Arie Jeffrey Den Boef

IPC分类号： G01N21/00

CPC分类号： G03F1/84 ,  G01N21/47 ,  G01N21/95607

摘要： A method and apparatus is used for inspection of devices to detect processing faults on semiconductor wafers. The method includes illuminating a strip of a die along a scan path with a moving measurement spot. The method further includes detecting scattered radiation to obtain an angle-resolved spectrum, and comparing the scattering data with a library of reference spectra. Based on the comparison, the method includes determining the presence of a fault of the die at the strip. The illumination and detection are performed along the scan path across a region, such that the scattering data is spatially integrated over the region.

摘要翻译： 一种方法和装置用于检查用于检测半导体晶片上的处理故障的装置。 该方法包括用移动测量点沿扫描路径照射模具条。 该方法还包括检测散射辐射以获得角度分辨光谱，并将散射数据与参考光谱库进行比较。 基于比较，该方法包括确定在条带处存在管芯的故障。 照射和检测沿着跨越区域的扫描路径执行，使得散射数据在该区域上被空间整合。

公开(公告)号：US08743361B2

公开(公告)日：2014-06-03

申请号：US13098759

申请日：2011-05-02

申请人： Johan Frederik Dijksman ,  Arie Jeffrey Den Boef ,  Sander Frederik Wuister ,  Martinus Bernardus Van Der Mark

发明人： Johan Frederik Dijksman ,  Arie Jeffrey Den Boef ,  Sander Frederik Wuister ,  Martinus Bernardus Van Der Mark

IPC分类号： G01B11/00 ,  B41F1/34 ,  B41F21/12 ,  B41F21/14 ,  B41L1/02 ,  B41L3/02 ,  B41L3/08

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7042 ,  G03F9/7049 ,  G03F9/7076

摘要： A method of aligning a substrate and an imprint template is disclosed. The method includes directing an alignment radiation beam towards an imprint template alignment mark and an adjacent substrate alignment mark, the imprint template alignment mark and the substrate alignment mark each including a grating which extends in a first direction and a grating which extends in a second direction, providing relative movement between the imprint template and the substrate in the first direction and in the second direction, using an intensity detector to detect the intensity of alignment radiation redirected in the zero-order direction by the imprint template alignment mark and the substrate alignment mark during the relative movement in the first direction and in the second direction, and determining an aligned position of the imprint template alignment mark and the substrate alignment mark based upon the detected intensity.

摘要翻译： 公开了一种对准衬底和压印模板的方法。 该方法包括将对准辐射束引向印模模板对准标记和相邻的​​衬底对准标记，印模模板对准标记和衬底对准标记各自包括在第一方向上延伸的光栅和沿第二方向延伸的光栅 使用强度检测器，通过压印模板对准标记和基板对准标记来检测在零级方向上重定向的对准辐射的强度，在第一方向和第二方向上提供压印模板和基板之间的相对移动 在第一方向和第二方向的相对移动期间，基于检测到的强度确定压印模板对准标记和基板对准标记的对准位置。

公开(公告)号：US20140146297A1

公开(公告)日：2014-05-29

申请号：US13883083

申请日：2011-10-06

申请人： Yuri Vainer ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Arie Jeffrey Den Boef

发明人： Yuri Vainer ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Arie Jeffrey Den Boef

IPC分类号： G03F7/20 ,  G01N21/956

CPC分类号： G03F7/7085 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95623 ,  G01N2021/95676 ,  G03F1/24 ,  G03F1/84 ,  G03F7/70916

摘要： An EUV lithography reticle is inspected to detect contaminant particles. The inspection apparatus comprises illumination optics with primary radiation. An imaging optical system with plural branches is arranged to form and detect a plurality of images, each branch having an image sensor and forming its image with a different portion of radiation received from the illuminated article. A processor combines information from the detected images to report on the presence and location of contaminant particles. In one or more branches the primary radiation is filtered out, so that the detected image is formed using only secondary radiation emitted by contaminant material in response to the primary radiation. In a dark field imaging branch using the scattered primary radiation, a spatial filter blocks spatial frequency components associated with periodic features of the article under inspection, to allow detection of particles which cannot be detected by secondary radiation.

摘要翻译： 检查EUV光刻掩模版以检测污染物颗粒。 检查装置包括具有初级辐射的照明光学器件。 布置具有多个分支的成像光学系统以形成和检测多个图像，每个分支具有图像传感器并且形成具有从照明物品接收的辐射的不同部分的图像。 处理器结合来自检测图像的信息，报告污染物颗粒的存在和位置。 在一个或多个分支中，主辐射被滤出，使得仅使用由污染物材料响应于初级辐射发射的二次辐射形成检测到的图像。 在使用散射的初级辐射的暗场成像分支中，空间滤波器阻挡与被检查物品的周期特征相关联的空间频率分量，以允许检测不能被二次辐射检测的粒子。

公开(公告)号：US08508736B2

公开(公告)日：2013-08-13

申请号：US12751479

申请日：2010-03-31

申请人： Arie Jeffrey Den Boef ,  Harry Sewell ,  Keith William Andresen ,  Earl William Ebert, Jr. ,  Sanjeev Kumar Singh

发明人： Arie Jeffrey Den Boef ,  Harry Sewell ,  Keith William Andresen ,  Earl William Ebert, Jr. ,  Sanjeev Kumar Singh

IPC分类号： G01B11/00

CPC分类号： G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

摘要： A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.

摘要翻译： 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。

公开(公告)号：US08264686B2

公开(公告)日：2012-09-11

申请号：US12390528

申请日：2009-02-23

申请人： Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Stefan Carolus Jacobus Antonius Keij

发明人： Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Stefan Carolus Jacobus Antonius Keij

IPC分类号： G01B11/00 ,  G03B27/42

CPC分类号： G03B27/42 ,  G03F7/70633

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one reference grating having line elements in a second, perpendicular, direction. A measurement set of gratings is provided on top of the reference set of gratings, the measurement set comprising three measurement gratings similar to the reference gratings. Two of the measurement gratings are oppositely biased in the second direction relative to the respective reference gratings. An overlay measurement device is provided to measure asymmetry of the three gratings in the reference set and the measurement set, and to derive from the measured asymmetry the overlay in both the first and second direction.

摘要翻译： 布置成将图案从图案形成装置转印到衬底上的光刻设备包括设置在衬底中的参考光栅组，该参考组包括在第一方向上具有线元件的两个参考光栅和在第二方向上具有线元件的一个参考光栅 ，垂直，方向。 光栅的测量组提供在参考光栅组的顶部，测量组包括与参考光栅相似的三个测量光栅。 两个测量光栅相对于各个参考光栅在第二方向上相反地偏置。 提供覆盖测量装置以测量参考组和测量组中的三个光栅的不对称性，并且从第一和第二方向上的测量的不对称性导出覆盖。