发明申请
- 专利标题： PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE
- 专利标题（中）： 光电导电材料及其制备方法和使用方法
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申请号： US12550683申请日： 2009-08-31
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公开(公告)号： US20110048787A1公开(公告)日： 2011-03-03
- 发明人: Robert David Allen , Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Ratnam Sooriyakumaran
- 申请人： Robert David Allen , Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Ratnam Sooriyakumaran
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： H05K1/11
- IPC分类号： H05K1/11 ; C08G77/14 ; G03C1/00 ; G03F7/20
摘要：
Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.