发明申请
US20110049430A1 METHOD FOR MAKING POLYMER, COATING ELECTRODE, AND ASSOCIATED POLYMER AND ELECTRODE
有权
制备聚合物,涂层电极及相关聚合物和电极的方法
- 专利标题: METHOD FOR MAKING POLYMER, COATING ELECTRODE, AND ASSOCIATED POLYMER AND ELECTRODE
- 专利标题(中): 制备聚合物,涂层电极及相关聚合物和电极的方法
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申请号: US12550827申请日: 2009-08-31
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公开(公告)号: US20110049430A1公开(公告)日: 2011-03-03
- 发明人: Zhigang Deng , Hai Yang , Liping Zheng , Su Lu , Lin Chen , Hui Liu , Wei Cai , Xianguo Yu
- 申请人: Zhigang Deng , Hai Yang , Liping Zheng , Su Lu , Lin Chen , Hui Liu , Wei Cai , Xianguo Yu
- 申请人地址: US NY Schenectady
- 专利权人: GENERAL ELECTRIC COMPANY
- 当前专利权人: GENERAL ELECTRIC COMPANY
- 当前专利权人地址: US NY Schenectady
- 主分类号: H01B1/12
- IPC分类号: H01B1/12 ; C08G69/08 ; B05D5/12 ; C08J5/20 ; B01J39/20
摘要:
A method is provided, comprising: copolymerizing a monomer comprising at least two amide groups, a monomer of formula (a) and a sulfonic acid or salt monomer, wherein R1 is CH3 or H. A polymer made by the method is provided. A method for coating an electrode is provided, comprising: providing an electrode; providing a solution of a free radical initiator, a monomer comprising at least two amide groups, a monomer of formula (a) and a sulfonic acid or salt monomer; wetting the electrode with the solution; and heating the wetted electrode; whereby the monomer comprising at least two amide groups, the monomer of formula (a), and the sulfonic acid or salt monomer are copolymerized; wherein R1 is CH3 or H. An electrode coated by the method is provided.
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