发明申请
- 专利标题: POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION
- 专利标题(中): 阳性型光敏组合物
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申请号: US12991690申请日: 2009-05-13
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公开(公告)号: US20110064913A1公开(公告)日: 2011-03-17
- 发明人: Motoki Takahashi , Toshiyuki Ogata , Christopher Cordonier , Akimasa Nakamura , Tetsuya Shichi , Teruhiro Uematsu
- 申请人: Motoki Takahashi , Toshiyuki Ogata , Christopher Cordonier , Akimasa Nakamura , Tetsuya Shichi , Teruhiro Uematsu
- 申请人地址: JP Kawasaki-shi, Kanagawa JP Nagoya-shi, Aichi
- 专利权人: TOKYO OHKA KOGYO CO., LTD,CENTRAL JAPAN RAILWAY COMPANY
- 当前专利权人: TOKYO OHKA KOGYO CO., LTD,CENTRAL JAPAN RAILWAY COMPANY
- 当前专利权人地址: JP Kawasaki-shi, Kanagawa JP Nagoya-shi, Aichi
- 优先权: JP2008-126793 20080514
- 国际申请: PCT/JP2009/058937 WO 20090513
- 主分类号: B32B3/10
- IPC分类号: B32B3/10 ; G03F7/004
摘要:
Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.
公开/授权文献
- US08426107B2 Positive-type photosensitive composition 公开/授权日:2013-04-23
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