公开(公告)号：US08426107B2

公开(公告)日：2013-04-23

申请号：US12991690

申请日：2009-05-13

申请人： Motoki Takahashi ,  Toshiyuki Ogata ,  Christopher Cordonier ,  Akimasa Nakamura ,  Tetsuya Shichi ,  Teruhiro Uematsu

发明人： Motoki Takahashi ,  Toshiyuki Ogata ,  Christopher Cordonier ,  Akimasa Nakamura ,  Tetsuya Shichi ,  Teruhiro Uematsu

IPC分类号： G03F7/00 ,  G03F7/004 ,  B32B3/10

CPC分类号： C23C18/14 ,  G03F7/0047 ,  G03F7/0226 ,  Y10T428/24479

摘要： Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.

摘要翻译： 公开了能够以高分辨率形成金属化合物膜图案并且较少受有机残基影响的正型感光性组合物。 正型感光性组合物包括：金属络合物成分（A），其可以在涂布后随后烧制时形成金属化合物膜; 和光敏剂（B）。 在组合物中，组分（A）中的配体优选为具有芳族化合物作为其骨架的多齿配体。 根据该结构，即使是基本上不含感光性树脂的组合物也能赋予光敏性，容易形成金属化合物膜图案。

公开(公告)号：US20110064913A1

公开(公告)日：2011-03-17

申请号：US12991690

申请日：2009-05-13

申请人： Motoki Takahashi ,  Toshiyuki Ogata ,  Christopher Cordonier ,  Akimasa Nakamura ,  Tetsuya Shichi ,  Teruhiro Uematsu

发明人： Motoki Takahashi ,  Toshiyuki Ogata ,  Christopher Cordonier ,  Akimasa Nakamura ,  Tetsuya Shichi ,  Teruhiro Uematsu

IPC分类号： B32B3/10 ,  G03F7/004

CPC分类号： C23C18/14 ,  G03F7/0047 ,  G03F7/0226 ,  Y10T428/24479

摘要： Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.

摘要翻译： 公开了能够以高分辨率形成金属化合物膜图案并且较少受有机残基影响的正型感光性组合物。 正型感光性组合物包括：金属络合物成分（A），其可以在涂布后随后烧制时形成金属化合物膜; 和光敏剂（B）。 在组合物中，组分（A）中的配体优选为具有芳族化合物作为其骨架的多齿配体。 根据该结构，即使是基本上不含感光性树脂的组合物也能赋予光敏性，容易形成金属化合物膜图案。

公开(公告)号：US08445118B2

公开(公告)日：2013-05-21

申请号：US12307725

申请日：2007-07-12

申请人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima ,  Makoto Yamashita

发明人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima ,  Makoto Yamashita

IPC分类号： B32B15/00

CPC分类号： C01G23/053 ,  B01J21/066 ,  B01J37/0219 ,  C01P2002/84 ,  C09C1/3607 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1279 ,  Y10T428/31678

摘要： A coating liquid including one or more of metal complexes selected from a metal complex A represented by Chemical Formula 1, a metal complex B represented by Chemical Formula 2, and a metal complex C represented by Chemical Formula 3. M in Formula 1, 2 and 3 represents a metal ion. Each of X1-X4 in Formula 1, 2 and 3 is one of O, NH, CO2 and S. Each of Y1-Y8 in Formula 1 and Y1-Y4 in Formula 3 is either CH or N. Each of Z1-Z3 in Formula 2 and 3 and Z4-Z6 in Formula 2 is one selected from a group of O, NH and S, and two selected from a group of CH and N. L represents an axial ligand. k represents a valence of each of the metal complexes and is equal to a sum of electric charges of M, X1-X4 and L.

摘要翻译： 包含选自由化学式1表示的金属络合物A，由化学式2表示的金属络合物B的金属络合物A和由化学式3表示的金属络合物C的金属络合物中的一种或多种的涂布液。式1， 3表示金属离子。 式1，2和3中的X 1 -X 4各自为O，NH，CO 2和S中的一个。式1中的Y1-Y8和式3中的Y1-Y4各自为CH或N.每个Z1-Z3在 式2中的式2和3以及Z 4 -Z 6是选自O，NH和S的一个，选自CH和N的两个.L表示轴配体。 k表示每个金属络合物的化合价，并且等于M，X1-X4和L的电荷之和。

公开(公告)号：US20100062281A1

公开(公告)日：2010-03-11

申请号：US12226827

申请日：2007-01-31

申请人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Makoto Yamashita ,  Akira Fujishima

发明人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Makoto Yamashita ,  Akira Fujishima

IPC分类号： B32B9/04 ,  B05D5/12 ,  H01B1/12

CPC分类号： C01G23/053 ,  B01J21/066 ,  B01J37/0219 ,  C01P2002/84 ,  C09C1/3607 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1279 ,  Y10T428/31678

摘要： The present invention provides a technology related to a conductive film which is high in transparency, conductivity, and adhesiveness to a base plate. The present invention also provides a coating liquid including metal materials reacting with a ligand represented by Chemical Formula 1 and including indium (In), tin (Sn), or both thereof. Each of R21—R24 in the Chemical Formula 1 is one of the followings (1)-(11) and X11 and X12 is either hetero atoms or carboxylic acid. (1) a group represented by ClH2l+1 (aforementioned l is an integral number of 0 to 4), (2) a group represented by CmH2m (aforementioned m is an integral number of 2 to 4), (3) a group represented by CnH2n−1 (aforementioned n is an integral number of 2 to 4), (4) a group represented by COOR (aforementioned R is CpH2p+1 (aforementioned p is an integral number of 0 to 4) or a group represented by R═C6H5), (5) a group represented by aldehyde, ketones, COCqH2q+1 (aforementioned q is an integral number of 0 to 4), or benzophenone, (6) hydroxyl (OH) or ethers, (7) amine (NH2) or alkylamine, (8) amide (9) halogens (10) nitrile (CN) (11) nitro (NO2)

摘要翻译： 本发明提供了与基板的透明性，导电性和粘合性高的导电膜相关的技术。 本发明还提供了包含与由化学式1表示的配体反应并包括铟（In），锡（Sn）或其二者的金属材料的涂布液。 化学式1中的R 21 -R 24各自为以下（1） - （11）之一，X 11和X 12为杂原子或羧酸。 （1）由ClH2l + 1表示的基团（上述l为0〜4的整数），（2）由CmH2m表示的基团（上述m为2〜4的整数），（3）表示的基团 由CnH2n-1（上述n为2〜4的整数），（4）由COOR表示的基团（上述R为CpH2p + 1（上述p为0〜4的整数）或由R ≡C6H5），（5）由醛，酮，COCqH2q + 1（上述q为0〜4的整数）表示的基团，或二苯甲酮，（6）羟基（OH）或醚，（7）胺（NH 2 ）或烷基胺，（8）酰胺（9）卤素（10）腈（CN）（11）硝基（NO 2）

公开(公告)号：US08003219B2

公开(公告)日：2011-08-23

申请号：US12226827

申请日：2007-01-31

申请人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Makoto Yamashita ,  Akira Fujishima

发明人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Makoto Yamashita ,  Akira Fujishima

IPC分类号： B32B17/06 ,  B05D3/02

CPC分类号： C01G23/053 ,  B01J21/066 ,  B01J37/0219 ,  C01P2002/84 ,  C09C1/3607 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1279 ,  Y10T428/31678

摘要： The present invention provides a technology related to a conductive film which is high in transparency, conductivity, and adhesiveness to a base plate. The present invention also provides a coating liquid including metal materials reacting with a ligand represented by a particular Chemical Formula and including indium (In), tin (Sn), or both thereof.

摘要翻译： 本发明提供了与基板的透明性，导电性和粘合性高的导电膜相关的技术。 本发明还提供了包含与特定化学式表示的配体反应的金属材料，包括铟（In），锡（Sn）或其二者的涂布液。

公开(公告)号：US07993753B2

公开(公告)日：2011-08-09

申请号：US12226826

申请日：2006-12-25

申请人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima

发明人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima

IPC分类号： B32B17/06 ,  B05D3/02

CPC分类号： C01G23/053 ,  B01J21/066 ,  B01J37/0219 ,  C01P2002/84 ,  C09C1/3607 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1279 ,  Y10T428/31678

摘要： The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R1-R8 in Chemical Formula 1 is one of the followings (1)-(4): (1) a group represented by CnH2n+1 (aforementioned n is an integral number equal to or larger than 0); (2) a group represented by COOR9 (aforementioned R9 is a group represented by CmH2m+1, and aforementioned m is an integral number equal to or larger than 0); (3) a halogen atom; and (4) CN or NO2.

公开(公告)号：US07964283B2

公开(公告)日：2011-06-21

申请号：US12226835

申请日：2006-12-15

申请人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima

发明人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima

IPC分类号： B32B17/06 ,  B05D3/02

CPC分类号： C01G23/053 ,  B01J21/066 ,  B01J37/0219 ,  C01P2002/84 ,  C09C1/3607 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1279 ,  Y10T428/31678

摘要： The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R1-R8 in Chemical Formula 1 is one of the followings (1)-(4): (1) a group represented by CnH2n+1 (aforementioned n is an integral number equal to or larger than 0); (2) a group represented by COOR9 (aforementioned R9 is a group represented by CmH2m+1, and aforementioned m is an integral number equal to or larger than 0); (3) a halogen atom; and (4) CN or NO2.

摘要翻译： 本发明提供包含化学式1表示的有机金属配合物的涂布液。化学式1中的R 1 -R 8是以下（1）〜（4）之一：（1）由C n H 2n + 1表示的基团（上述n 是等于或大于0的整数）; （2）由COOR9表示的基团（上述R9为由CmH2m + 1表示的基团，上述m为0以上的整数）。 （3）卤原子; 和（4）CN或NO2。

公开(公告)号：US20090324963A1

公开(公告)日：2009-12-31

申请号：US12307725

申请日：2007-07-12

申请人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima ,  Makoto Yamashita

发明人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima ,  Makoto Yamashita

IPC分类号： B32B17/06 ,  C07F5/06 ,  C07F7/02 ,  C07F7/28 ,  C07F15/00 ,  C09D7/12 ,  B05D3/02 ,  B32B15/04

CPC分类号： C01G23/053 ,  B01J21/066 ,  B01J37/0219 ,  C01P2002/84 ,  C09C1/3607 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1279 ,  Y10T428/31678

摘要： A coating liquid including one or more of metal complexes selected from a metal complex A represented by Chemical Formula 1, a metal complex B represented by Chemical Formula 2, and a metal complex C represented by Chemical Formula 3. M in Chemical Formula 1, Chemical Formula 2 and Chemical Formula 3 represents a metal ion. Each of X1-X4 in Chemical Formula 1, Chemical Formula 2 and Chemical Formula 3 is one of O, NH, CO2 and S. Each of Y1-Y8 in Chemical Formula 1 and Y1-Y4 in Chemical Formula 3 is either CH or N. Each of Z1-Z3 in Chemical Formula 2 and Chemical Formula 3 and Z4-Z6 in Chemical Formula 2 is one selected from a group of O, NH and S, and two selected from a group of CH and N. L in Chemical Formula 1, Chemical Formula 2 and Chemical Formula 3 represents an axial ligand. k in Chemical Formula 1, Chemical Formula 2 and Chemical Formula 3 represents a valence of each of the metal complexes and is equal to a sum of electric charges of M, X1-X4 and L.

摘要翻译： 包含一种或多种选自由化学式1表示的金属络合物A，由化学式2表示的金属络合物B和由化学式3表示的金属络合物C的金属络合物的涂层液。化学式1中的M，化学式 式2和化学式3表示金属离子。 化学式1，化学式2和化学式3中的X 1 -X 4各自为O，NH，CO 2和S中的一种。化学式1中的Y1-Y8和化学式3中的Y1-Y4均为CH或N 化学式2和化学式3中的Z1-Z3和化学式2中的Z4-Z6各自为选自O，NH和S的一种，并且选自化学式中的CH和N.L中的两种 1，化学式2和化学式3表示轴配体。 化学式1，化学式2和化学式3中的k表示每个金属络合物的化合价，并且等于M，X1-X4和L的电荷之和。

公开(公告)号：US20090169899A1

公开(公告)日：2009-07-02

申请号：US12226835

申请日：2006-12-15

申请人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima

发明人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima

IPC分类号： B32B17/06 ,  C07F7/28 ,  B05D3/02 ,  C01G23/047

CPC分类号： C01G23/053 ,  B01J21/066 ,  B01J37/0219 ,  C01P2002/84 ,  C09C1/3607 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1279 ,  Y10T428/31678

摘要： The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R1-R8 in Chemical Formula 1 is one of the followings (1)-(4): (1) a group represented by CnH2n+1 (aforementioned n is an integral number equal to or larger than 0); (2) a group represented by COOR9 (aforementioned R9 is a group represented by CmH2m+1, and aforementioned m is an integral number equal to or larger than 0); (3) a halogen atom; and (4) CN or NO2.

摘要翻译： 本发明提供包含化学式1表示的有机金属配合物的涂布液。化学式1中的R 1 -R 8是以下（1）〜（4）之一：（1）由C n H 2n + 1表示的基团（上述n 是等于或大于0的整数）; （2）由COOR9表示的基团（上述R9为由CmH2m + 1表示的基团，上述m为0以上的整数）。 （3）卤原子; 和（4）CN或NO2。

公开(公告)号：US20090075094A1

公开(公告)日：2009-03-19

申请号：US12226826

申请日：2006-12-25

申请人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima

发明人： Christopher Cordonier ,  Tetsuya Shichi ,  Takafumi Numata ,  Kenichi Katsumata ,  Akimasa Nakamura ,  Yasuhiro Katsumata ,  Teruo Komine ,  Kenichirou Amemiya ,  Akira Fujishima

IPC分类号： B32B17/06 ,  C09D7/12 ,  B05D3/08

CPC分类号： C01G23/053 ,  B01J21/066 ,  B01J37/0219 ,  C01P2002/84 ,  C09C1/3607 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1279 ,  Y10T428/31678

摘要： The present invention provides a coating liquid including organic metal complexes represented by Chemical Formula 1. R1—R8 in Chemical Formula 1 is one of the followings (1)-(4): (1) a group represented by CnH2n+1 (aforementioned n is an integral number equal to or larger than 0); (2) a group represented by COOR9 (aforementioned R9 is a group represented by CmH2m+1, and aforementioned m is an integral number equal to or larger than 0); (3) a halogen atom; and (4) CN or NO2.

摘要翻译： 本发明提供包含化学式1表示的有机金属配合物的涂布液。化学式1中的R 1 -R 8是以下（1）〜（4）之一：（1）由C n H 2n + 1表示的基团（上述n 是等于或大于0的整数）; （2）由COOR9表示的基团（上述R9为由CmH2m + 1表示的基团，上述m为0以上的整数）。 （3）卤原子; 和（4）CN或NO2。