发明申请
- 专利标题： PHOTODIODES AND METHODS FOR FABRICATING PHOTODIODES
- 专利标题（中）： 用于制备光刻胶的光致抗体和方法
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申请号： US12885138申请日： 2010-09-17
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公开(公告)号： US20110068426A1公开(公告)日： 2011-03-24
- 发明人: Dong Zheng , Joy Jones
- 申请人： Dong Zheng , Joy Jones
- 申请人地址： US CA Milpitas
- 专利权人： INTERSIL AMERICAS INC.
- 当前专利权人： INTERSIL AMERICAS INC.
- 当前专利权人地址： US CA Milpitas
- 主分类号： H01L31/0232
- IPC分类号： H01L31/0232 ; H01L31/18
摘要：
A photodiode includes an opening over an active photodiode region so that a top passivation layer and interlayer dielectric layers (ILDs) do not affect the spectral response of the photodiode. A dielectric reflective optical coating filter, which includes a plurality of dielectric layers, fills at least a portion of the opening and thereby covers the active photodiode region, to shape a spectral response of the photodiode. Alternatively, the dielectric reflective optical coating filter is formed prior to the opening, and the opening is formed by removing a top passivation coating and ILDs to expose the dielectric reflective optical coating filter.