Invention Application
- Patent Title: EUV Optics
- Patent Title (中): EUV光学
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Application No.: US12927063Application Date: 2010-11-05
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Publication No.: US20110075253A1Publication Date: 2011-03-31
- Inventor: Norbert R. Bowering , Igor V. Fomenkov
- Applicant: Norbert R. Bowering , Igor V. Fomenkov
- Applicant Address: US CA San Diego
- Assignee: Cymer,Inc.
- Current Assignee: Cymer,Inc.
- Current Assignee Address: US CA San Diego
- Main IPC: G02B7/185
- IPC: G02B7/185 ; G02B7/198 ; B23P17/04 ; B05D5/06

Abstract:
In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si3N4, B4C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions and a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal.
Public/Granted literature
- US08598549B2 EUV optics Public/Granted day:2013-12-03
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