发明申请
- 专利标题: INTERMETAL STACK FOR USE IN A PHOTOVOLTAIC CELL
- 专利标题(中): 用于光伏电池的间隔堆叠
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申请号: US12571415申请日: 2009-09-30
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公开(公告)号: US20110076796A1公开(公告)日: 2011-03-31
- 发明人: S. Brad Herner , Mark H. Clark
- 申请人: S. Brad Herner , Mark H. Clark
- 申请人地址: US CA San Jose
- 专利权人: TWIN CREEKS TECHNOLOGIES, INC.
- 当前专利权人: TWIN CREEKS TECHNOLOGIES, INC.
- 当前专利权人地址: US CA San Jose
- 主分类号: H01L31/18
- IPC分类号: H01L31/18
摘要:
A donor silicon wafer may be bonded to a substrate and a lamina cleaved from the donor wafer. A photovoltaic cell may be formed from the lamina bonded to the substrate. An intermetal stack is described that is optimized for use in such a cell. The intermetal stack may include a transparent conductive oxide layer serving as a quarter-wave plate, a low resistance layer, an adhesion layer to help adhesion to the receiver element, and may also include a barrier layer to prevent or impede unwanted diffusion within the stack.
公开/授权文献
- US08049104B2 Intermetal stack for use in a photovoltaic cell 公开/授权日:2011-11-01
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