发明申请
- 专利标题： SUPERIOR FILL CONDITIONS IN A REPLACEMENT GATE APPROACH BY PERFORMING A POLISHING PROCESS BASED ON A SACRIFICIAL FILL MATERIAL
- 专利标题（中）： 通过基于真空填充材料执行抛光过程的替代浇口方法中的高级填充条件
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申请号： US12893102申请日： 2010-09-29
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公开(公告)号： US20110076844A1公开(公告)日： 2011-03-31
- 发明人: Jens Heinrich , Gerd Marxsen , Katja Steffen
- 申请人： Jens Heinrich , Gerd Marxsen , Katja Steffen
- 优先权： DE102009043628.6 20090930
- 主分类号： H01L21/28
- IPC分类号： H01L21/28
摘要：
In a replacement gate approach, a top area of a gate opening may receive a superior cross-sectional shape after the deposition of a work function adjusting species on the basis of a polishing process, wherein a sacrificial material may protect the sensitive materials in the gate opening.