Invention Application
US20110079819A1 IGBT WITH FAST REVERSE RECOVERY TIME RECTIFIER AND MANUFACTURING METHOD THEREOF
有权
IGBT具有快速恢复时间整流器及其制造方法
- Patent Title: IGBT WITH FAST REVERSE RECOVERY TIME RECTIFIER AND MANUFACTURING METHOD THEREOF
- Patent Title (中): IGBT具有快速恢复时间整流器及其制造方法
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Application No.: US12615278Application Date: 2009-11-10
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Publication No.: US20110079819A1Publication Date: 2011-04-07
- Inventor: Wei-Chieh Lin , Jen-Hao Yeh , Ho-Tai Chen
- Applicant: Wei-Chieh Lin , Jen-Hao Yeh , Ho-Tai Chen
- Priority: TW098133846 20091006
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L21/331

Abstract:
An IGBT with a fast reverse recovery time rectifier includes an N-type drift epitaxial layer, a gate, a gate insulating layer, a P-type doped base region, an N-type doped source region, a P-type doped contact region, and a P-type lightly doped region. The P-type doped base region is disposed in the N-type drift epitaxial layer, and the P-type doped contact region is disposed in the N-type drift epitaxial layer. The P-type lightly doped region is disposed between the P-type contact doped region and the N-type drift epitaxial layer, and is in contact with the N-type drift epitaxial layer.
Public/Granted literature
- US08242537B2 IGBT with fast reverse recovery time rectifier and manufacturing method thereof Public/Granted day:2012-08-14
Information query
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