发明申请
- 专利标题: POWER SEMICONDUCTOR DEVICES, METHODS, AND STRUCTURES WITH Embedded Dielectric Layers Containing Permanent Charges
- 专利标题(中): 功率半导体器件,方法和结构与包含永久电荷的嵌入式介电层
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申请号: US12759696申请日: 2010-04-13
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公开(公告)号: US20110079843A1公开(公告)日: 2011-04-07
- 发明人: Mohamed N. Darwish , Jun Zeng , Richard A. Blanchard
- 申请人: Mohamed N. Darwish , Jun Zeng , Richard A. Blanchard
- 申请人地址: US CA Santa Clara
- 专利权人: MaxPower Semiconductor, Inc.
- 当前专利权人: MaxPower Semiconductor, Inc.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L29/78
- IPC分类号: H01L29/78
摘要:
Power devices using refilled trenches with permanent charge at or near their sidewalls. These trenches extend vertically into a drift region.
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