发明申请
- 专利标题： PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC MATERIALS, FORMULATIONS, PRECURSORS AND METHODS OF USE THEREOF
- 专利标题（中）： 适用于多孔电介质材料，制剂，前驱物及其使用方法的光致电介质材料
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申请号： US12575515申请日： 2009-10-08
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公开(公告)号： US20110083887A1公开(公告)日： 2011-04-14
- 发明人: Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Jitendra Singh Rathore , Ratnam Sooriyakumaran
- 申请人： Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Jitendra Singh Rathore , Ratnam Sooriyakumaran
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： H05K1/03
- IPC分类号： H05K1/03 ; C08G77/14 ; G03F7/004 ; G03F7/20 ; C07F7/08
摘要：
Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.
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