发明申请
- 专利标题: PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC EUV PROJECTION EXPOSURE APPARATUS
- 专利标题(中): 微波预处理曝光装置的投影目标
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申请号: US12904513申请日: 2010-10-14
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公开(公告)号: US20110090559A1公开(公告)日: 2011-04-21
- 发明人: Siegfried Rennon , Hans-Juergen Mann , Thomas Schicketanz
- 申请人: Siegfried Rennon , Hans-Juergen Mann , Thomas Schicketanz
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT GmbH
- 当前专利权人: Carl Zeiss SMT GmbH
- 当前专利权人地址: DE Oberkochen
- 优先权: DE102009049640.8 20091015
- 主分类号: G02B17/06
- IPC分类号: G02B17/06
摘要:
A projection objective for a microlithographic EUV projection exposure apparatus includes a first mirror and a second mirror. The first mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The second mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The first and second mirrors are configured so that, with otherwise equal irradiation by EUV light, the mirror substrate of the first mirror compacts less than the mirror substrate of the second mirror under the effect of the EUV light.
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