- 专利标题: GAS TREATMENT SYSTEMS
-
申请号: US12951361申请日: 2010-11-22
-
公开(公告)号: US20110091648A1公开(公告)日: 2011-04-21
- 发明人: Bojan Mitrovic , Alex Gurary , Eric A. Armour
- 申请人: Bojan Mitrovic , Alex Gurary , Eric A. Armour
- 申请人地址: US NY Plainview
- 专利权人: VEECO INSTRUMENTS INC.
- 当前专利权人: VEECO INSTRUMENTS INC.
- 当前专利权人地址: US NY Plainview
- 主分类号: C23C16/455
- IPC分类号: C23C16/455 ; C23C16/458 ; C23C16/18
摘要:
An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radial rows which terminate radially inward from the reactor wall to minimize deposition of the reactants on the reactor wall. The injector head desirably also has inlets (125) for a second gas such as ammonia arranged in a field between the rows of first gas inlets, and additionally has a center inlet (135) for the second gas coaxial with the axis of rotation.
公开/授权文献
- US09273395B2 Gas treatment systems 公开/授权日:2016-03-01
信息查询
IPC分类: