发明申请
- 专利标题： SYSTEM AND METHOD FOR MONITORING WAFER STRESS
- 专利标题（中）： 用于监测波浪应力的系统和方法
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申请号： US12616415申请日： 2009-11-11
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公开(公告)号： US20110094538A1公开(公告)日： 2011-04-28
- 发明人: John Valcore , Mark Kawaguchi , Cristian Paduraru
- 申请人： John Valcore , Mark Kawaguchi , Cristian Paduraru
- 主分类号： B08B3/04
- IPC分类号： B08B3/04 ; G05D16/00 ; G01L19/12
摘要：
A method of using a processing system that is operable to deposit liquid and to remove liquid by way of negative pressure. The method includes arranging a device to have at least one of the liquid deposited thereon by the processing system and the liquid removed therefrom by the processing system. The device has a sensor portion disposed thereon. The sensor portion can provide a sensor signal based on pressure related to the at least one of the liquid being deposited thereon by the processing system and the liquid being removed therefrom by the processing system. The method further includes performing at least one of depositing, by the processing system, the liquid onto the device and removing the liquid, by the processing system, from the device. The method still further includes providing the sensor signal, by the sensor portion, based on the pressure related to the at least one of the liquid being deposited onto the device and the liquid being removed from the device.
公开/授权文献
- US08293023B2 System and method for monitoring wafer stress 公开/授权日：2012-10-23
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IPC分类:
