发明申请
US20110097514A1 Method for Fabricating Fine Conductive Patterns Using Surface Modified Mask Template
有权
使用表面改性掩模模板制造精细导电图案的方法
- 专利标题: Method for Fabricating Fine Conductive Patterns Using Surface Modified Mask Template
- 专利标题(中): 使用表面改性掩模模板制造精细导电图案的方法
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申请号: US12616853申请日: 2009-11-12
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公开(公告)号: US20110097514A1公开(公告)日: 2011-04-28
- 发明人: Dong-Youn Shin , Taik-Min Lee
- 申请人: Dong-Youn Shin , Taik-Min Lee
- 申请人地址: KR Daejeon
- 专利权人: Korea Institute of Machinery & Materials
- 当前专利权人: Korea Institute of Machinery & Materials
- 当前专利权人地址: KR Daejeon
- 优先权: KR1020090101310 20091023
- 主分类号: B05D5/12
- IPC分类号: B05D5/12 ; B05D3/06
摘要:
Disclosed is a method for fabricating fine conductive patterns using a surface modified mask template, the method including: depositing a high molecular substance on a substrate; applying a hydrophobic material onto the high molecular substance so that the hydrophobic material can infiltrate into the high molecular substance; forming a mask template by removing a part of the high molecular substance to form a recess where a region of the substrate is exposed to an outside; depositing conductive ink on the mask template; and performing annealing to abstract metal particles from a metallic compound dissolved in the conductive ink so that an insulating pattern can be formed in a region on which the high molecular substance is deposited, but a conductive pattern can be formed as the metal particles are abstracted from the conductive ink in the recess and cohere with each other.
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