发明申请
- 专利标题: Gallium nitride semiconductor
- 专利标题(中): 氮化镓半导体
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申请号: US12930179申请日: 2010-12-30
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公开(公告)号: US20110101371A1公开(公告)日: 2011-05-05
- 发明人: TingGang Zhu , Bryan S. Shelton , Marek K. Pabisz , Mark Gottfried , Linlin Liu , Milan Pophristic , Michael Murphy , Rick Stall
- 申请人: TingGang Zhu , Bryan S. Shelton , Marek K. Pabisz , Mark Gottfried , Linlin Liu , Milan Pophristic , Michael Murphy , Rick Stall
- 申请人地址: US CA San Jose
- 专利权人: Power Integrations, Inc.
- 当前专利权人: Power Integrations, Inc.
- 当前专利权人地址: US CA San Jose
- 主分类号: H01L29/20
- IPC分类号: H01L29/20
摘要:
A gallium nitride based semiconductor Schottky diode fabricated from a n+ doped GaN layer having a thickness between one and six microns disposed on a sapphire substrate; an n− doped GaN layer having a thickness greater than one micron disposed on said n+ GaN layer patterned into a plurality of elongated fingers and a metal layer disposed on the n− doped GaN layer and forming a Schottky junction therewith. The layer thicknesses and the length and width of the elongated fingers are optimized to achieve a device with breakdown voltage of greater than 500 volts, current capacity in excess of one ampere, and a forward voltage of less than three volts.
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