发明申请
US20110101459A1 Thin Film Transistors and Fabrication Methods Thereof 审中-公开
薄膜晶体管及其制作方法

Thin Film Transistors and Fabrication Methods Thereof
摘要:
Thin film transistors and fabrication methods thereof. A gate is formed overlying a portion of a substrate. A first vanadium oxide layer formed overlying the gate and the substrate. A gate-insulating layer is formed overlying the first vanadium oxide layer. A semiconductor layer is formed on a portion of the gate-insulating layer. A source and a drain are formed on a portion of the semiconductor layer.
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