发明申请
- 专利标题： METHOD FOR TREATING A METAL OXIDE LAYER
- 专利标题（中）： 用于处理金属氧化物层的方法
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申请号： US12936187申请日： 2009-04-06
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公开(公告)号： US20110104885A1公开(公告)日： 2011-05-05
- 发明人: Joop Van Deelen , Paulus Willibrordus George Poodt
- 申请人： Joop Van Deelen , Paulus Willibrordus George Poodt
- 申请人地址： NL Delft
- 专利权人： NEDERLANDSE ORGANISATIE VOOR TOEGEPASTNATUURWETENSCHAPPELIJK ONDERZOEK TNO
- 当前专利权人： NEDERLANDSE ORGANISATIE VOOR TOEGEPASTNATUURWETENSCHAPPELIJK ONDERZOEK TNO
- 当前专利权人地址： NL Delft
- 优先权： EP08154100.5 20080404
- 国际申请： PCT/NL09/50176 WO 20090406
- 主分类号： H01L21/283
- IPC分类号： H01L21/283
摘要：
The invention relates to a method for treating a metal oxide layer deposited on a substrate. The method comprises the step of applying a substantially atmospheric plasma process at a relatively low temperature. Preferably, the temperature during the plasma process is lower than approximately 180° C. Further, the atmospheric plasma process can be applied in a plasma chamber comprising H2 gas and He gas.
公开/授权文献
- US08349642B2 Method for treating a metal oxide layer 公开/授权日：2013-01-08
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