发明申请
- 专利标题: SYSTEM AND METHOD FOR MANIPULATING AN ION BEAM
- 专利标题(中): 用于操纵离子束的系统和方法
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申请号: US12944537申请日: 2010-11-11
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公开(公告)号: US20110114849A1公开(公告)日: 2011-05-19
- 发明人: Frank Sinclair , Victor M. Benveniste , Svetlana Radovanov , James S. Buff
- 申请人: Frank Sinclair , Victor M. Benveniste , Svetlana Radovanov , James S. Buff
- 申请人地址: US MA Gloucester
- 专利权人: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES , INC.
- 当前专利权人: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES , INC.
- 当前专利权人地址: US MA Gloucester
- 主分类号: H01J1/50
- IPC分类号: H01J1/50
摘要:
A system for manipulating an ion beam having a principal axis includes an upper member having a first and a second coil generally disposed in different regions of the upper member and configured to conduct, independently of each other, a first and a second current, respectively. A lower member includes a third and a fourth coil that are generally disposed opposite to respective first and second coils and are configured to conduct, independently of each other, a third and a fourth current, respectively. A lens gap is defined between the upper and lower members, and configured to transmit the ion beam, wherein the first through fourth currents produce a 45 degree quadrupole field that exerts a rotational force on the ion beam about its principal axis.
公开/授权文献
- US08604443B2 System and method for manipulating an ion beam 公开/授权日:2013-12-10
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