发明申请
- 专利标题: EDRAM Architecture
- 专利标题(中): EDRAM架构
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申请号: US12624509申请日: 2009-11-24
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公开(公告)号: US20110121372A1公开(公告)日: 2011-05-26
- 发明人: Wootag Kang , Zhongze Wang
- 申请人: Wootag Kang , Zhongze Wang
- 申请人地址: US CA San Diego
- 专利权人: QUALCOMM INCORPORATED
- 当前专利权人: QUALCOMM INCORPORATED
- 当前专利权人地址: US CA San Diego
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L21/8242
摘要:
A process for manufacturing an eDRAM device comprises fabricating semiconductor features on a semiconductor substrate, the semiconductor substrate including a DRAM area and logic area. The process also includes fabricating a first conductive layer in the DRAM area and in the logic area, the first conductive layer in communication with a first group of the semiconductor features. After fabricating the first conductive layer, a storage component is fabricated in communication with a second group of the semiconductor features within the DRAM area.
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