发明申请
- 专利标题: Mems Resonator and Manufacturing Method of the Same
- 专利标题(中): Mems谐振器及其制造方法
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申请号: US13012099申请日: 2011-01-24
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公开(公告)号: US20110121908A1公开(公告)日: 2011-05-26
- 发明人: Shogo Inaba , Akira Sato , Toru Watanabe , Takeshi Mori
- 申请人: Shogo Inaba , Akira Sato , Toru Watanabe , Takeshi Mori
- 申请人地址: JP Tokyo
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-338042 20061215
- 主分类号: H03K3/36
- IPC分类号: H03K3/36
摘要:
A resonator with a microeletromechanical system structure has a transistor with a gate electrode, a capacitor with an upper and lower electrode, a substrate, a first and second structure of the microelectromechanical system structure, a first silicon layer of the first structure and the upper electrode formed above the substrate, a second silicon layer of the second structure and the gate electrode unit formed above the substrate, and an insulating film formed above the capacitor and the transistor, the insulating film having an opening for placement of the second structure.
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