Invention Application
- Patent Title: Lithographic Apparatus and Method of Manufacturing an Electrostatic Clamp for a Lithographic Apparatus
- Patent Title (中): 平版印刷设备和制造用于平版印刷设备的静电夹具的方法
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Application No.: US13020399Application Date: 2011-02-03
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Publication No.: US20110126406A1Publication Date: 2011-06-02
- Inventor: Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
- Applicant: Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H01B13/00
- IPC: H01B13/00
Abstract:
The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
Public/Granted literature
- US08476167B2 Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus Public/Granted day:2013-07-02
Information query
