发明申请
- 专利标题: Surface Inspection Method and Surface Inspection Apparatus
- 专利标题(中): 表面检查方法和表面检查装置
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申请号: US13032165申请日: 2011-02-22
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公开(公告)号: US20110141461A1公开(公告)日: 2011-06-16
- 发明人: Shigeru MATSUI , Masayuki Hachiya
- 申请人: Shigeru MATSUI , Masayuki Hachiya
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-193184 20060713
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
Light from a light source becomes two illumination beams by a beam splitter. The beams are irradiated onto a semiconductor wafer from two mutually substantially orthogonal azimuthal angles having substantially equal elevation angles to form illumination spots. When the sum of scattered, diffracted, and reflected lights due to the illumination beams is detected, influence of the anisotropy which a contaminant particle and a defect existing in the wafer itself or thereon have with respect to an illumination direction, can be eliminated.
公开/授权文献
- US08305568B2 Surface inspection method and surface inspection apparatus 公开/授权日:2012-11-06