发明申请
- 专利标题: SEMICONDUCTOR WITH LOW DISLOCATION
- 专利标题(中): 具有低偏差的半导体
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申请号: US13048905申请日: 2011-03-16
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公开(公告)号: US20110163295A1公开(公告)日: 2011-07-07
- 发明人: PENG YI WU , SHIH CHENG HUANG , PO MIN TU , YING CHAO YEH , WEN YU LIN , SHIH HSIUNG CHAN
- 申请人: PENG YI WU , SHIH CHENG HUANG , PO MIN TU , YING CHAO YEH , WEN YU LIN , SHIH HSIUNG CHAN
- 申请人地址: TW Hsinchu Hsien
- 专利权人: ADVANCED OPTOELECTRONIC TECHNOLOGY, INC.
- 当前专利权人: ADVANCED OPTOELECTRONIC TECHNOLOGY, INC.
- 当前专利权人地址: TW Hsinchu Hsien
- 优先权: TW97139665 20081016
- 主分类号: H01L33/06
- IPC分类号: H01L33/06 ; H01L29/06
摘要:
A semiconductor includes a semiconductor layer, a plurality of recesses and a blocking layer. The recesses are formed on a surface of the semiconductor layer by etching fragile locations of the semiconductor layer where dislocation occurs. The blocking layer is filled in each recess. The semiconductor further includes a re-epitaxial semiconductor layer grown from a surface of the semiconductor layer without the covering of blocking layer, and the re-epitaxial semiconductor layer laterally overgrows toward areas of the recesses for overlaying the blocking layer.
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