发明申请
- 专利标题: Reducing Drift in Chalcogenide Devices
- 专利标题(中): 减少硫族化物装置中的漂移
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申请号: US13072002申请日: 2011-03-25
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公开(公告)号: US20110168965A1公开(公告)日: 2011-07-14
- 发明人: Semyon D. Savransky
- 申请人: Semyon D. Savransky
- 主分类号: H01L45/00
- IPC分类号: H01L45/00
摘要:
Chalcogenide materials conventionally used in chalcogenide memory devices and ovonic threshold switches may exhibit a tendency called drift, wherein threshold voltage or resistance changes with time. By providing a compensating material which exhibits an opposing tendency, the drift may be compensated. The compensating material may be mixed into a chalcogenide, may be layered with chalcogenide, may be provided with a heater, or may be provided as part of an electrode in some embodiments. Both chalcogenide and non-chalcogenide compensating materials may be used.
公开/授权文献
- US08164949B2 Reducing drift in chalcogenide devices 公开/授权日:2012-04-24
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