发明申请
- 专利标题： FILM FORMATION METHOD AND STORAGE MEDIUM
- 专利标题（中）： 电影形成方法和存储媒体
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申请号： US13054331申请日： 2010-08-27
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公开(公告)号： US20110174630A1公开(公告)日： 2011-07-21
- 发明人: Yasuhiko Kojima , Shuji Azumo
- 申请人： Yasuhiko Kojima , Shuji Azumo
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2009-215415 20090917
- 国际申请： PCT/JP2010/064572 WO 20100827
- 主分类号： C23C28/02
- IPC分类号： C23C28/02
摘要：
A film formation method includes preparing a substrate formed a Co film as a seed layer on a surface of the substrate, applying a negative voltage to the substrate such that a surface potential of Co is lower than an oxidation potential of the Co, and in a state when the negative voltage is applied to the substrate, dipping the Co film in a plating solution mainly containing copper sulfate solution, thereby a Cu film is formed on the Co film of the substrate by electroplating.
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