发明申请
- 专利标题: Wafer-Level Semiconductor Device Packages with Three-Dimensional Fan-Out and Manufacturing Methods Thereof
- 专利标题(中): 具有三维扇出的晶圆级半导体器件封装及其制造方法
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申请号: US12691660申请日: 2010-01-21
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公开(公告)号: US20110177654A1公开(公告)日: 2011-07-21
- 发明人: Ming-Chiang Lee , Chien-Hao Wang
- 申请人: Ming-Chiang Lee , Chien-Hao Wang
- 专利权人: Advanced Semiconductor Engineering, Inc.
- 当前专利权人: Advanced Semiconductor Engineering, Inc.
- 主分类号: H01L21/98
- IPC分类号: H01L21/98 ; H01L21/56
摘要:
In one embodiment, a method of forming a semiconductor device package includes: (1) providing a carrier and a semiconductor device including an active surface; (2) forming a first redistribution structure including a first electrical interconnect extending laterally within the first structure and a plurality of second electrical interconnects extending vertically from a first surface of the first interconnect, each second interconnect including a lower surface adjacent to the first surface and an upper surface opposite the lower surface; (3) disposing the device on the carrier such that the active surface is adjacent to the carrier; (4) disposing the first structure on the carrier such that the upper surface of each second interconnect is adjacent to the carrier, and the second interconnects are positioned around the device; and (5) forming a second redistribution structure adjacent to the active surface, and including a third electrical interconnect extending laterally within the second structure.
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