发明申请
- 专利标题: RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题(中): 辐射源,光刻设备和器件制造方法
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申请号: US13058776申请日: 2009-07-30
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公开(公告)号: US20110188014A1公开(公告)日: 2011-08-04
- 发明人: Vadim Yevgenyevich Banine , Erik Roelof , Johannes Hubertus Josephina Moors
- 申请人: Vadim Yevgenyevich Banine , Erik Roelof , Johannes Hubertus Josephina Moors
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 国际申请: PCT/EP2009/005509 WO 20090730
- 主分类号: G03B27/54
- IPC分类号: G03B27/54
摘要:
A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.