公开(公告)号：US20110188014A1

公开(公告)日：2011-08-04

申请号：US13058776

申请日：2009-07-30

申请人： Vadim Yevgenyevich Banine ,  Erik Roelof ,  Johannes Hubertus Josephina Moors

发明人： Vadim Yevgenyevich Banine ,  Erik Roelof ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/54

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003

摘要： A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.

摘要翻译： 光刻设备包括被配置为产生极紫外辐射的辐射源，所述辐射源包括其中产生等离子体的室; 收集器反射镜，被配置为反射等离子体发射的辐射; 以及包括气体供应系统的碎片减缓系统，所述气体供应系统被配置为朝向所述等离子体供应第一气流，所述第一气流被选择为热等离子体产生的碎屑，以及布置在靠近所述收集器反射镜的位置处的多个气体歧管， 所述气体歧管被构造成在所述室中提供第二气流，所述第二气流指向所述等离子体以防止热碎屑沉积在所述收集器反射镜上。