发明申请
- 专利标题: OPTICAL DEVICE WAFER PROCESSING METHOD
- 专利标题(中): 光学器件波形处理方法
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申请号: US13011266申请日: 2011-01-21
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公开(公告)号: US20110195535A1公开(公告)日: 2011-08-11
- 发明人: Tasuku Koyanagi , Hiroshi Morikazu
- 申请人: Tasuku Koyanagi , Hiroshi Morikazu
- 申请人地址: JP Tokyo
- 专利权人: DISCO CORPORATION
- 当前专利权人: DISCO CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-024543 20100205
- 主分类号: H01L21/304
- IPC分类号: H01L21/304
摘要:
An optical device wafer processing method for dividing an optical device wafer into a plurality of individual optical devices. The optical device wafer is composed of a substrate and a semiconductor layer formed on the front side of the substrate. The optical devices are partitioned by a plurality of crossing division lines formed on the semiconductor layer. The optical device wafer processing method includes a division start point forming step of applying a laser beam having a transmission wavelength to the substrate to the intersections of the crossing division lines in the condition where the focal point of the laser beam is set inside the substrate in an area corresponding to the intersections of the crossing division lines, thereby forming a plurality of modified dots as division start points inside the substrate at the intersections of the crossing division lines; and a crack growing step of applying a CO2 laser beam along the division lines to grow cracks inside the substrate from the division start points.
公开/授权文献
- US08178425B2 Optical device wafer processing method 公开/授权日:2012-05-15
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