发明申请
- 专利标题: CONDUCTIVE COMPOSITIONS AND PROCESSES FOR USE IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES
- 专利标题(中): 用于制造半导体器件的导电组合物和工艺
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申请号: US13098855申请日: 2011-05-02
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公开(公告)号: US20110203659A1公开(公告)日: 2011-08-25
- 发明人: Alan Frederick Carroll , Kenneth Warren Hang
- 申请人: Alan Frederick Carroll , Kenneth Warren Hang
- 申请人地址: US DE Wilmington
- 专利权人: E. I. DU PONT DE NEMOURS AND COMPANY
- 当前专利权人: E. I. DU PONT DE NEMOURS AND COMPANY
- 当前专利权人地址: US DE Wilmington
- 主分类号: H01L31/0224
- IPC分类号: H01L31/0224 ; H01B1/22 ; H01L21/283 ; H01L29/45
摘要:
The present invention is directed to a thick film conductive composition comprising: (a) electrically conductive silver powder; (b) zinc-containing additive; (c) glass frit wherein said glass frit is lead-free; dispersed in (d) organic medium. The present invention is further directed to an electrode formed from the composition above wherein said composition has been fired to remove the organic vehicle and sinter said glass particles. Still further, the invention is directed to a method of manufacturing a semiconductor device from a structural element composed of a semiconductor having a p-n junction and an insulating film formed on a main surface of the semiconductor comprising the steps of (a) applying onto said insulating film the thick film composition detailed above; and (b) firing said semiconductor, insulating film and thick film composition to form an electrode. Additionally, the present invention is directed to a semiconductor device formed by the method detailed above and a semiconductor device formed from the thick film conductive composition detailed above.
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