Invention Application
US20110204314A1 RESISTIVE MEMORY CELLS AND DEVICES HAVING ASYMMETRICAL CONTACTS
审中-公开
电阻记忆体和具有不对称接触的装置
- Patent Title: RESISTIVE MEMORY CELLS AND DEVICES HAVING ASYMMETRICAL CONTACTS
- Patent Title (中): 电阻记忆体和具有不对称接触的装置
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Application No.: US13100702Application Date: 2011-05-04
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Publication No.: US20110204314A1Publication Date: 2011-08-25
- Inventor: In-Gyu Baek , Moon-Sook Lee , Dong-Chul Kim
- Applicant: In-Gyu Baek , Moon-Sook Lee , Dong-Chul Kim
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Priority: KR2005-25561 20050328
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
A memory cell includes a plug-type first electrode in a substrate, a magneto-resistive memory element disposed on the first electrode, and a second electrode disposed on the magneto-resistive memory element opposite the first electrode. The second electrode has an area of overlap with the magneto-resistive memory element that is greater than an area of overlap of the first electrode and the magneto-resistive memory element. The first surface may, for example, be substantially circular and have a diameter less than a minimum planar dimension (e.g., width) of the second surface. The magneto-resistive memory element may include a colossal magneto-resistive material, such as an insulating material with a perovskite phase and/or a transition metal oxide.
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