发明申请
- 专利标题： ASYMMETRIC PHOTO-PATTERNABLE SOL-GEL PRECURSORS AND THEIR METHODS OF PREPARATION
- 专利标题（中）： 不对称照相溶胶凝胶前体及其制备方法
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申请号： US13125955申请日： 2009-09-23
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公开(公告)号： US20110207049A1公开(公告)日： 2011-08-25
- 发明人: Joshua Tillema , Mohanalingam Kathaperumal , Wan-Yun Hsieh , Michiharu Yamamoto
- 申请人： Joshua Tillema , Mohanalingam Kathaperumal , Wan-Yun Hsieh , Michiharu Yamamoto
- 申请人地址： JP Ibaraki, Osaka
- 专利权人： Nito Denko Corporation
- 当前专利权人： Nito Denko Corporation
- 当前专利权人地址： JP Ibaraki, Osaka
- 国际申请： PCT/US2009/058098 WO 20090923
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C07F7/18 ; C08F230/08
摘要：
Described herein are photo-patternable sol-gel precursors and their methods of preparation. The sol-gel precursors are thermally stable and form compositions that have high refractive indices and low optical loss values. The precursors can be used to make sol-gel compositions that are ideally suited toward optical waveguide applications in the realm of telecommunications wavelengths.
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