发明申请
US20110207052A1 SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE
有权
含有磺酰胺的光催化剂组合物及其使用方法
- 专利标题： SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE
- 专利标题（中）： 含有磺酰胺的光催化剂组合物及其使用方法
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申请号： US12709346申请日： 2010-02-19
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公开(公告)号： US20110207052A1公开(公告)日： 2011-08-25
- 发明人: Daniel Paul Sanders , Masaki Fujiwara , Yoshiharu Terui
- 申请人： Daniel Paul Sanders , Masaki Fujiwara , Yoshiharu Terui
- 申请人地址： US NY Armonk JP Tokyo
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION,CENTRAL GLASS CO., LTD
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION,CENTRAL GLASS CO., LTD
- 当前专利权人地址： US NY Armonk JP Tokyo
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/004
摘要：
Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol-soluble photoresists for resist-on-resist applications. The sulfonamide-containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
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