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1.发明授权公开(公告)号：US08143369B2
公开(公告)日：2012-03-27
申请号：US12770857
申请日：2010-04-30
申请人： Masaki Fujiwara , James Lupton Hedrick , Daniel Paul Sanders , Yoshiharu Terui , Manabu Yasumoto
发明人： Masaki Fujiwara , James Lupton Hedrick , Daniel Paul Sanders , Yoshiharu Terui , Manabu Yasumoto
CPC分类号： C08G64/1633 , C07D319/06 , C08G63/08 , C08G63/64 , C08G64/0233 , C08G64/0241 , C08G64/025 , C08G64/38 , C08G64/42 , C08G2261/126 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
摘要翻译： 公开了一种制备包含活性五氟苯基酯基团的环状羰基化合物的一锅法。 环状羰基化合物可以通过开环方法聚合以形成包含包含侧链五氟苯酯基的重复单元的ROP聚合物。 使用合适的亲核试剂，可以在开环聚合前后选择性地将五氟苯基酯基团转变成多种其它官能团。
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公开(公告)号：US09223209B2
公开(公告)日：2015-12-29
申请号：US12709346
申请日：2010-02-19
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol-soluble photoresists for resist-on-resist applications. The sulfonamide-containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
摘要翻译： 提供了用于光刻工艺的含磺酰胺的光致抗蚀剂组合物，其具有用于高分辨率，低模糊成像的改进的性质。 还提供了用于抗蚀剂抗蚀剂应用的醇溶性光致抗蚀剂。 本发明的含磺酰胺的光致抗蚀剂组合物包括具有如式（I）所示的具有支链连接基团的磺酰胺取代的重复单元的正色调光致抗蚀剂组合物：
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3.发明授权Sulfonamide-containing topcoat and photoresist additive compositions and methods of use 有权含磺酰胺的面漆和光致抗蚀剂添加剂组合物和使用方法公开(公告)号：US09223217B2
公开(公告)日：2015-12-29
申请号：US12709277
申请日：2010-02-19
CPC分类号： C09D133/16 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
摘要翻译： 提供了与本领域已知的相比，具有改进的静态后退水接触角的用于光刻工艺的含磺酰胺的组合物，面漆聚合物和添加剂聚合物。 本发明的含磺酰胺的面漆聚合物和添加剂聚合物包括具有支链连接基团的磺酰胺取代的重复单元，如式（I）所示：
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公开(公告)号：US08455612B2
公开(公告)日：2013-06-04
申请号：US13414803
申请日：2012-03-08
申请人： Masaki Fujiwara , James Lupton Hedrick , Daniel Paul Sanders , Yoshiharu Terui , Manabu Yasumoto
发明人： Masaki Fujiwara , James Lupton Hedrick , Daniel Paul Sanders , Yoshiharu Terui , Manabu Yasumoto
CPC分类号： C08G64/1633 , C07D319/06 , C08G63/08 , C08G63/64 , C08G64/0233 , C08G64/0241 , C08G64/025 , C08G64/38 , C08G64/42 , C08G2261/126 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
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5.发明申请Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use 有权含磺酰胺的面漆和光致抗蚀剂添加剂组合物和使用方法公开(公告)号：US20110207051A1
公开(公告)日：2011-08-25
申请号：US12709277
申请日：2010-02-19
IPC分类号： G03F7/027 , G03F7/20 , C08F265/06 , C09D133/12
CPC分类号： C09D133/16 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
摘要翻译： 提供了与本领域已知的相比，具有改进的静态后退水接触角的用于光刻工艺的含磺酰胺的组合物，面漆聚合物和添加剂聚合物。 本发明的含磺酰胺的面漆聚合物和添加剂聚合物包括具有支链连接基团的磺酰胺取代的重复单元，如式（I）所示：
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公开(公告)号：US20110207052A1
公开(公告)日：2011-08-25
申请号：US12709346
申请日：2010-02-19
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol-soluble photoresists for resist-on-resist applications. The sulfonamide-containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
摘要翻译： 提供了用于光刻工艺的含磺酰胺的光致抗蚀剂组合物，其具有用于高分辨率，低模糊成像的改进的性质。 还提供了用于抗蚀剂抗蚀剂应用的醇溶性光致抗蚀剂。 本发明的含磺酰胺的光致抗蚀剂组合物包括具有如式（I）所示的具有支链连接基团的磺酰胺取代的重复单元的正色调光致抗蚀剂组合物：
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7.发明申请公开(公告)号：US20120178891A1
公开(公告)日：2012-07-12
申请号：US13414803
申请日：2012-03-08
申请人： Masaki Fujiwara , James L. Hedrick , Alshakim Nelson , Daniel P. Sanders , Yoshiharu Terui , Manabu Yasumoto
发明人： Masaki Fujiwara , James L. Hedrick , Alshakim Nelson , Daniel P. Sanders , Yoshiharu Terui , Manabu Yasumoto
IPC分类号： C08F124/00 , C08G64/00
CPC分类号： C08G64/1633 , C07D319/06 , C08G63/08 , C08G63/64 , C08G64/0233 , C08G64/0241 , C08G64/025 , C08G64/38 , C08G64/42 , C08G2261/126 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
摘要翻译： 公开了一种制备包含活性五氟苯基酯基团的环状羰基化合物的一锅法。 环状羰基化合物可以通过开环方法聚合以形成包含包含侧链五氟苯酯基的重复单元的ROP聚合物。 使用合适的亲核试剂，可以在开环聚合前后选择性地将五氟苯基酯基团转变成多种其它官能团。
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8.发明申请公开(公告)号：US20100305281A1
公开(公告)日：2010-12-02
申请号：US12770857
申请日：2010-04-30
申请人： Masaki Fujiwara , James L. Hedrick , Alshakim Nelson , Daniel P. Sanders , Yoshiharu Terui , Manabu Yasumoto
发明人： Masaki Fujiwara , James L. Hedrick , Alshakim Nelson , Daniel P. Sanders , Yoshiharu Terui , Manabu Yasumoto
IPC分类号： C07D319/06 , C08G64/00 , C08F283/02
CPC分类号： C08G64/1633 , C07D319/06 , C08G63/08 , C08G63/64 , C08G64/0233 , C08G64/0241 , C08G64/025 , C08G64/38 , C08G64/42 , C08G2261/126 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
摘要翻译： 公开了一种制备包含活性五氟苯基酯基团的环状羰基化合物的一锅法。 环状羰基化合物可以通过开环方法聚合以形成包含包含侧链五氟苯酯基的重复单元的ROP聚合物。 使用合适的亲核试剂，可以在开环聚合前后选择性地将五氟苯基酯基团转变成多种其它官能团。
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公开(公告)号：US08410290B2
公开(公告)日：2013-04-02
申请号：US13491802
申请日：2012-06-08
IPC分类号： C07D321/00
CPC分类号： C07D319/04 , C07D317/36 , C08G64/0233 , C08G64/30 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
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10.发明授权Cyclic carbonyl compounds with pendant carbonate groups, preparations thereof, and polymers therefrom 有权具有侧碳酸酯基团的环状羰基化合物，其制备物及其聚合物公开(公告)号：US08389746B2
公开(公告)日：2013-03-05
申请号：US13491847
申请日：2012-06-08
IPC分类号： C07D321/00
CPC分类号： C07D319/04 , C07D317/36 , C08G64/0233 , C08G64/30 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
摘要翻译： 公开了一种制备包含活性五氟苯基碳酸酯基团的环状羰基化合物的一锅法。 环状羰基化合物可以通过开环方法聚合以形成包含包含侧链五氟苯基碳酸酯基团的重复单元的ROP聚合物。 使用合适的亲核试剂，可以在开环聚合之前或之后将五氟苯基五氟苯基碳酸酯基团选择性地转化成多种其它官能团。
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