发明申请
US20110209995A1 Physical Vapor Deposition With A Variable Capacitive Tuner and Feedback Circuit
审中-公开
物理气相沉积与可变电容调谐器和反馈电路
- 专利标题： Physical Vapor Deposition With A Variable Capacitive Tuner and Feedback Circuit
- 专利标题（中）： 物理气相沉积与可变电容调谐器和反馈电路
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申请号： US12823893申请日： 2010-06-25
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公开(公告)号： US20110209995A1公开(公告)日： 2011-09-01
- 发明人: Muhammad M. Rasheed , Ronald D. DeDore , Michael S. Cox , Keith A. Miller , Donny Young , John C. Forster , Adolph M. Allen , Lara Hawrylchak
- 申请人： Muhammad M. Rasheed , Ronald D. DeDore , Michael S. Cox , Keith A. Miller , Donny Young , John C. Forster , Adolph M. Allen , Lara Hawrylchak
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： C23C14/34
- IPC分类号： C23C14/34
摘要：
Apparatus and methods for performing plasma processing on a wafer supported on a pedestal are provided. The apparatus can include a pedestal on which the wafer can be supported, a variable capacitor having a variable capacitance, a motor attached to the variable capacitor which varies the capacitance of the variable capacitor, a motor controller connected to the motor that causes the motor to rotate, and an output from the variable capacitor connected to the pedestal. A desired state of the variable capacitor is associated with a process recipe in a process controller. When the process recipe is executed the variable capacitor is placed in the desired state.
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