公开(公告)号：US5894381A

公开(公告)日：1999-04-13

申请号：US892457

申请日：1997-07-14

申请人： Adolph M. Allen ,  Jamshid Bozorgi

发明人： Adolph M. Allen ,  Jamshid Bozorgi

IPC分类号： G11B5/48 ,  G11B5/60

CPC分类号： G11B5/4833 ,  G11B5/484 ,  G11B5/6005

摘要： A load beam of a head suspension assembly includes a base plate attachment segment, and an intermediate region that extends integrally from the base plate attachment segment. A bend region extends integrally from the intermediate region for providing the load beam with a predetermined preload spring force and for increasing the lateral stiffness of the load beam. A forward section extends from the bend region, so that the center of gravity of the bend region and forward section is shifted toward the base plate attachment in order to improve the shock performance of the load beam, and so that a moment arm of the bend region and the forward section is shortened. In a preferred embodiment the intermediate region is wider than the base plate attachment segment.

摘要翻译： 头悬挂组件的负载梁包括基板附接段和从基板附接段一体地延伸的中间区域。 弯曲区域从中间区域一体地延伸，用于为负载梁提供预定的预载弹簧力并且用于增加负载梁的横向刚度。 前部从弯曲区域延伸，使得弯曲区域和向前区段的重心向基板附件移动，以改善负载梁的冲击性能，并且使得弯曲的力矩臂 区域缩小。 在优选实施例中，中间区域比基板附接段宽。

公开(公告)号：US20110209995A1

公开(公告)日：2011-09-01

申请号：US12823893

申请日：2010-06-25

申请人： Muhammad M. Rasheed ,  Ronald D. DeDore ,  Michael S. Cox ,  Keith A. Miller ,  Donny Young ,  John C. Forster ,  Adolph M. Allen ,  Lara Hawrylchak

发明人： Muhammad M. Rasheed ,  Ronald D. DeDore ,  Michael S. Cox ,  Keith A. Miller ,  Donny Young ,  John C. Forster ,  Adolph M. Allen ,  Lara Hawrylchak

IPC分类号： C23C14/34

CPC分类号： H01J37/3444 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32174 ,  H01J37/3438

摘要： Apparatus and methods for performing plasma processing on a wafer supported on a pedestal are provided. The apparatus can include a pedestal on which the wafer can be supported, a variable capacitor having a variable capacitance, a motor attached to the variable capacitor which varies the capacitance of the variable capacitor, a motor controller connected to the motor that causes the motor to rotate, and an output from the variable capacitor connected to the pedestal. A desired state of the variable capacitor is associated with a process recipe in a process controller. When the process recipe is executed the variable capacitor is placed in the desired state.

摘要翻译： 提供了在支撑在基座上的晶片上进行等离子体处理的装置和方法。 该装置可以包括可以支撑晶片的基座，具有可变电容的可变电容器，附接到可变电容器的电动机，其改变可变电容器的电容;连接到电动机的电动机控制器，其使电动机 旋转，以及连接到基座的可变电容器的输出。 可变电容器的期望状态与过程控制器中的过程配方相关联。 当执行处理配方时，将可变电容器置于所需状态。