发明申请
US20110210479A1 CONFINED PULSED LASER DEPOSITION METHOD FOR DEPOSITING METASTABLE THIN FILM
有权
用于沉积金属薄膜的配置脉冲激光沉积方法
- 专利标题: CONFINED PULSED LASER DEPOSITION METHOD FOR DEPOSITING METASTABLE THIN FILM
- 专利标题(中): 用于沉积金属薄膜的配置脉冲激光沉积方法
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申请号: US13037077申请日: 2011-02-28
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公开(公告)号: US20110210479A1公开(公告)日: 2011-09-01
- 发明人: Yingling Yang , Gary J. Cheng , Ji Li , Yi Zhang
- 申请人: Yingling Yang , Gary J. Cheng , Ji Li , Yi Zhang
- 主分类号: B29C35/08
- IPC分类号: B29C35/08
摘要:
A confined pulsed laser deposition method and apparatus that includes an ablative coating between a transparent confinement layer and a backing plane, and a laser beam directed through the confinement layer to ablate the coating at generally ambient temperature and pressure, and using laser induced pressure to synthesize metaphase from the ablative coating. For example, diamond phase carbon can be synthesized from a graphite coating. The laser beam can be directed through a focus lens to control the final spot size, or through a beam diffuser to make the intensity more uniform. An XYZ-stage can position a desired target area of the ablative coating to be irradiated by the laser beam. The laser beam can have an intensity of less than about 6 GW/cm2, or less than about 4 GW/cm2. The laser beam can have an excitation wavelength of about 568 nm.
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