发明申请
- 专利标题: SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
- 专利标题(中): 半导体存储器件及其制造方法
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申请号: US12834390申请日: 2010-07-12
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公开(公告)号: US20110227140A1公开(公告)日: 2011-09-22
- 发明人: Megumi ISHIDUKI , Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hideaki Aochi
- 申请人: Megumi ISHIDUKI , Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hideaki Aochi
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-060803 20100317
- 主分类号: H01L27/115
- IPC分类号: H01L27/115 ; H01L21/8246
摘要:
According to one embodiment, a semiconductor memory device includes a substrate, a stacked body, a memory film, and a SiGe film. The stacked body includes a plurality of conductive layers and a plurality of insulating layers alternately stacked above the substrate. The memory film includes a charge storage film. The memory film is provided on a sidewall of a memory hole punched through the stacked body. The SiGe film is provided inside the memory film in the memory hole.
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