发明申请
US20110229719A1 MANUFACTURING METHOD FOR CRYSTAL, MANUFACTURING APPARATUS FOR CRYSTAL, AND STACKED FILM
审中-公开
晶体制造方法,晶体和堆叠薄膜的制造方法
- 专利标题: MANUFACTURING METHOD FOR CRYSTAL, MANUFACTURING APPARATUS FOR CRYSTAL, AND STACKED FILM
- 专利标题(中): 晶体制造方法,晶体和堆叠薄膜的制造方法
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申请号: US13048064申请日: 2011-03-15
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公开(公告)号: US20110229719A1公开(公告)日: 2011-09-22
- 发明人: Taro NISHIGUCHI , Shin Harada
- 申请人: Taro NISHIGUCHI , Shin Harada
- 申请人地址: JP Osaka-shi
- 专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人地址: JP Osaka-shi
- 优先权: JP2010-059144 20100316
- 主分类号: C30B23/02
- IPC分类号: C30B23/02 ; B32B9/04 ; B32B15/04
摘要:
A manufacturing method for a crystal, a manufacturing apparatus for a crystal, and a stacked film capable of growing a high-quality crystal are provided. The manufacturing method for a crystal includes the steps of: preparing a seed crystal having a frontside surface and a backside surface opposite to the frontside surface; forming at least one film selected from the group consisting of a hard carbon film, a diamond film, a tantalum film, and a tantalum carbide film on the backside surface of the seed crystal; and growing the crystal on the frontside surface of the seed crystal.
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