发明申请
- 专利标题： SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- 专利标题（中）： 半导体器件及制造半导体器件的方法
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申请号： US12884764申请日： 2010-09-17
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公开(公告)号： US20110233622A1公开(公告)日： 2011-09-29
- 发明人: Aya Minemura , Kenji Sawamura , Mitsuhiro Noguchi
- 申请人： Aya Minemura , Kenji Sawamura , Mitsuhiro Noguchi
- 优先权： JP2010-066950 20100323
- 主分类号： H01L29/78
- IPC分类号： H01L29/78 ; H01L21/76
摘要：
According to one embodiment, a semiconductor device comprises an active area extending in a first direction, a contact plug located on a first portion of the active area, and a transistor located on a second portion adjacent to the first portion of the active area in the first direction. A width of a top surface area of the first portion in a second direction perpendicular to the first direction is smaller than that of a top surface area of the second portion in the second direction.
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