发明申请
- 专利标题: METHOD OF SURFACE TREATMENT AND SURFACE TREATED ARTICLE PROVIED BY THE SAME
- 专利标题(中): 表面处理方法及其表面处理制品
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申请号: US12732668申请日: 2010-03-26
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公开(公告)号: US20110236654A1公开(公告)日: 2011-09-29
- 发明人: Wen-Kuang HSU , Hsin-Fu Kuo , Chiung-Wen Tang , Po-Wen Jenq
- 申请人: Wen-Kuang HSU , Hsin-Fu Kuo , Chiung-Wen Tang , Po-Wen Jenq
- 主分类号: B32B18/00
- IPC分类号: B32B18/00 ; C23C16/40
摘要:
A method of surface treatment and surface treated article provided by the same are disclosed. The method of surface treatment of the present invention comprises: providing a substrate; and forming a ceramic layer on a surface of the substrate by atomic layer deposition (ALD), wherein the ceramic layer has a thickness of 1 nm to 1000 nm. The method of surface treatment of the present invention utilizes an atomic layer deposition (ALD) method to form a ceramic layer on a surface of the substrate, in which the formed ceramic layer has excellent uniformity and is randomly and entirely coated on the surface of the substrate. Therefore, the substrate surface treated by the method of the present invention is able to have a color the same as or different to that of the surface of the substrate and simultaneously prevent oxidation/tarnish occurring.
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