发明申请
- 专利标题: PLASMA PROCESSING APPARATUS
- 专利标题(中): 等离子体加工设备
-
申请号: US13129541申请日: 2009-11-17
-
公开(公告)号: US20110240222A1公开(公告)日: 2011-10-06
- 发明人: Ikuo Sawada , Songyun Kang , Shigeru Kasai
- 申请人: Ikuo Sawada , Songyun Kang , Shigeru Kasai
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-294871 20081118
- 国际申请: PCT/JP2009/069492 WO 20091117
- 主分类号: C23F1/08
- IPC分类号: C23F1/08 ; C23C16/455 ; C23C16/50 ; C23C16/52
摘要:
A gas shower head having many gas discharging ports formed on the lower surface is provided on the top wall of a processing container such that the gas shower head faces a placing table on which a substrate is to be placed, and the top wall of the processing container at the periphery of the gas shower head is composed of a dielectric material. A coil is provided on the dielectric material, and the phase of high frequency waves to be supplied to the gas shower head and the coil is adjusted so that the phase of the electrical field in a processing region above the substrate and the phase of the electrical field in the peripheral region surrounding the processing region are same or opposite to each other.
信息查询
IPC分类: