发明申请
- 专利标题： PMR writer with seamless shields and method of making it
- 专利标题（中）： PMR作者具有无缝屏障及其制作方法
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申请号： US12798560申请日： 2010-04-07
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公开(公告)号： US20110249364A1公开(公告)日： 2011-10-13
- 发明人: Zhigang Bai , Moris Dovek , Yan Wu , Cherng-Chyi Han , Jiun-Ting Lee
- 申请人： Zhigang Bai , Moris Dovek , Yan Wu , Cherng-Chyi Han , Jiun-Ting Lee
- 专利权人： Headway Technologies, Inc.
- 当前专利权人： Headway Technologies, Inc.
- 主分类号： G11B5/187
- IPC分类号： G11B5/187 ; B05D5/00 ; C23F1/02
摘要：
A process (and the structure resulting therefrom) is described for manufacturing a magnetic write head in which there is no physical interface between the first and second trailing shields. This is achieved by the introduction of a sacrificial layer immediately after the top yoke plating has been done and its photoresist mold has been stripped.
公开/授权文献
- US08209848B2 Method of making a PMR writer with seamless shields 公开/授权日：2012-07-03