发明申请
- 专利标题: SEMICONDUCTOR MEMORY AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 半导体存储器及其制造方法
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申请号: US13185930申请日: 2011-07-19
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公开(公告)号: US20110272745A1公开(公告)日: 2011-11-10
- 发明人: Masahiro Kiyotoshi , Akihito Yamamoto , Yoshio Ozawa , Fumitaka Arai , Riichiro Shirota
- 申请人: Masahiro Kiyotoshi , Akihito Yamamoto , Yoshio Ozawa , Fumitaka Arai , Riichiro Shirota
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-256194 20060921
- 主分类号: H01L27/105
- IPC分类号: H01L27/105
摘要:
A semiconductor memory includes a plurality of stripe-like active areas formed by stacking, in a direction perpendicular to a substrate, a plurality of layers extending parallel to the substrate, a first gate electrode formed on first side surfaces of the active areas, the first side surfaces being perpendicular to the substrate, a second gate electrode formed on second side surfaces of the active areas, the second side surfaces being perpendicular to the substrate. The layers are patterned in self-alignment with each other, intersections of the active areas and the first gate electrode form a plurality of memory cells, and the plurality of memory cells in an intersecting plane share the first gate electrode.
公开/授权文献
- US08766373B2 Semiconductor memory and method of manufacturing the same 公开/授权日:2014-07-01
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