发明申请
US20110272787A1 FORMATION OF SELENIDE, SULFIDE OR MIXED SELENIDE-SULFIDE FILMS ON METAL OR METAL COATED SUBSTRATES
审中-公开
在金属或金属涂层基体上形成硒化物，硫化物或混合的硫化铟锡膜
- 专利标题： FORMATION OF SELENIDE, SULFIDE OR MIXED SELENIDE-SULFIDE FILMS ON METAL OR METAL COATED SUBSTRATES
- 专利标题（中）： 在金属或金属涂层基体上形成硒化物，硫化物或混合的硫化铟锡膜
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申请号： US13105045申请日： 2011-05-11
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公开(公告)号： US20110272787A1公开(公告)日： 2011-11-10
- 发明人: Erten Eser , Shannon Fields
- 申请人： Erten Eser , Shannon Fields
- 申请人地址： US DE Newark
- 专利权人： University of Delaware
- 当前专利权人： University of Delaware
- 当前专利权人地址： US DE Newark
- 主分类号： H01L29/24
- IPC分类号： H01L29/24
摘要：
A composition for preventing cracking in composite structures comprising a metal coated substrate and a selenide, sulfide or mixed selenidesulfide film. Specifically, cracking is prevented in the coating of molybdenum coated substrates upon which a copper, indium-gallium diselenide (CIGS) film is deposited. Cracking is inhibited by adding a Se passivating amount of oxygen to the Mo and limiting the amount of Se deposited on the Mo coating.
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