发明申请
- 专利标题: Patterned Retarder Film and Method for Manufacturing the Same
- 专利标题(中): 图案化延迟膜及其制造方法
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申请号: US12973087申请日: 2010-12-20
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公开(公告)号: US20110292330A1公开(公告)日: 2011-12-01
- 发明人: Kuan-Hao Huang , Fung-Hsu Wu
- 申请人: Kuan-Hao Huang , Fung-Hsu Wu
- 申请人地址: TW Gueishan Township
- 专利权人: BenQ Materials Corp.
- 当前专利权人: BenQ Materials Corp.
- 当前专利权人地址: TW Gueishan Township
- 主分类号: G02F1/1335
- IPC分类号: G02F1/1335 ; B05D3/06 ; B05D3/12 ; B05D3/02 ; B05D5/06 ; B05D1/38
摘要:
A patterned retarder film comprises a first substrate, a pattern configuration, an alignment layer formed on the pattern configuration, and a liquid crystal layer disposed on the alignment layer. The pattern configuration comprises a plurality of first regions and a plurality of second regions, wherein the first regions are grating relief structure and interleaved with the second regions. A liquid crystal layer is coated on the alignment layer to cover the first regions and the second regions of the pattern configuration to a plane with a determined thickness on the surface of the first regions. The first phase retardation of the liquid crystal layer on the first regions and the second phase retardation of the liquid crystal layer on the second regions are different by 180°. The method for manufacturing the same is disclosed.
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